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主要用途：
FLH321HS材料，具有氣泡少、純度高，幾乎無包裹物、耐高溫性能等特性，

廣泛的應(yīng)用于半導(dǎo)體先進(jìn)制程、光學(xué)、化學(xué)加工、紫外線和高溫窗口等。


Main application：
Thanks to the few bubbles, high purity, almost no inclusion, 

high temperature resistant performance and other characteristics,

FLH321HS has been widely used in semiconductor advanced manufacturing,

 optical, chemical processing, UV and high temperature window.  

0716-8304668

0716-8333088